研究成果与著作 |
[1] Linlin Lu*, Jie Xu*, Yi Liu, et al. Effect of substrate bias voltage on infrared characteristic of TiN films, Journal of Electronic Materials. 2022, 12(51): 7267-7274. [2] Linlin Lu*, Jie Xu*, Yi Liu, et al. Effect of oxidation behavior on visible-infrared property of TiN films, Journal of Materials Science-Materials in Electronics. 2022, 6(33): 3267-3274. [3] Linlin Lu*, Jie Xu*, Jie Dong, et al. Investigation on Microstructure Evolution and Visible-infrared Property of Vacuum-heat-treated TiN Film, Journal of Materials Engineering and Performance,2022. doi:10.1007/s11665-022-07684-6. [4] Linlin Lu*, Fa Luo, Zhibin Huang, et al. Substrate temperature effects on infrared emissivity of TiNx films, Surface Engineering. 2019, 35: 9-13. [5] Linlin Lu*, Fa Luo, Zhibin Huang, et al. Influence of the nitrogen flow rate on the infrared emissivity of TiNx films, Infrared Physics & Technology. 2018, 88: 144-148. [6] Linlin Lu*, Fa Luo, Yuchang Qing, et al. Study on the electromagnetic interference shielding effectiveness of TiN film, Journal of Materials Science-Materials in Electronics. 2018, 29: 9052-9057. [7] Linlin Lu*, Fa Luo, Zhibin Huang, et al. Research on optical reflectance and infrared emissivity of TiNx films depending on sputtering pressure, Infrared Physics &Technology. 2018, 91:63-67. [8] Linlin Lu*, Fa Luo, Yuchang Qing, et al. Effect of N2 flow rate on electromagnetic interference shielding effectiveness of TiNx films, Applied Physics A. 2018, 124:721. |